Nickel sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.99% (metals basis)

CAS: 7440-02-0 | Ni | 58.69 g/mol

The accumulation of radiation defects in the crystal lattice of nickel in the course of irradiation leads to an increase in the metal sputtering yield from the surface of grains, making it comparable with the sputtering yield from the intergranular region. These result in development of the heavy ion acceleration facilities and for the high-energy heavy-ion doping of deep layers in semiconductors.

This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.